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| Tetramethylammonium hydroxide | |
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| IUPAC name | tetramethylammonium hydroxide |
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| Properties | |
| Molecular formula | C4H13NO |
| Molar mass | 91.15 g mol-1 |
| Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa) Infobox references |
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Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with the molecular formula (CH3)4NOH. It is used as an anisotropic etchant of silicon. It is also used as a basic solvent in the development of acidic photoresist in the photolithography process. Since it is a phase transfer catalyst, it is highly effective in stripping photoresist. It is used to prevent the nanoparticles in a ferrofluid from sticking together.
Toxicity
TMAH solution is a strong base. The tetramethylammonium ion can damage nerves and muscles, causing difficulties in breathing and possibly death in a short period of time after exposure by contact even with a small amount. It also smells like dead fish, if it is not pure, from trimethylamine impurity. TMAH has virtually no odor when pure.
Wet anisotropic Etching
TMAH solution is used to anisotropically etch silicon along its crystallographic axis. TMAH doesn't etch silicon nitride or silicon oxide. They are often used as mask for long Silicon etches.
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