MechanismDielectric mirrors function based on the interference of light reflected from the different layers of dielectric stack. This is the same principle used in multi-layer anti-reflection coatings, which are dielectric stacks which have been designed to minimize rather than maximize reflectivity. Simple dielectric mirrors function like one-dimensional photonic crystals, consisting of a stack of layers with a high refractive index interleaved with layers of a low refractive index (see diagram). The thicknesses of the layers are chosen such that the path-length differences for reflections from different high-index layers are integer multiples of the wavelength for which the mirror is designed. The reflections from the low-index layers have exactly half a wavelength in path length difference, but there is a 180-degree difference in phase shift at a low-to-high index boundary, compared to a high-to-low index boundary, which means that these reflections are also in phase. In the case of a mirror at normal incidence, the layers have a thickness of a quarter wavelength. Other designs have a more complicated structure generally produced by numerical optimization. In the latter case, the phase dispersion of the reflected light can also be controlled. In the design of dielectric mirrors, an optical transfer-matrix method can be used. Dielectric mirrors exhibit retardance as a function of angle of incidence and mirror design.[1] ManufacturingThe manufacturing techniques for dielectric mirrors are based on thin-film deposition methods. Common techniques are physical vapor deposition (which includes evaporative deposition and ion beam assisted deposition), chemical vapor deposition, ion beam deposition, molecular beam epitaxy, and sputter deposition. Common materials are magnesium fluoride, silicon dioxide, tantalum pentoxide, zinc sulfide (n=2.32), and titanium dioxide (n=2.4). See alsoReferences
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